译 名：
Ar ion beam etching analysis of pesticide residue boundary layer for apple cuticle basing on XPS
作 者：
ZHANG Xinyan,ZHAO Da,WANG Lexin,WANG Chang(College of Art and Sciences,Heilongjiang Bayi Agricultural University,Daqing Heilongjiang 163319,China)
关键词：
apple cuticle;XPS;pesticide residue;in-depth analysis
摘 要：
Pesticide residues of apple cuticle were detected and analyzed through micro-depth probe.Results showed that the omethoate and the dichlorvos on apple cuticle showed a non-linear regularity along vertical depth with the volume and time pesticide application.The major parts of residues were stratum corneum and they were 8 μm inside from the apple surface.Residues distribution of the omethoate was more regular than that of the dichlorvos.
