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当前位置: 首页 > 文章 > 光逆境下小麦旗叶类囊体膜特性的变化 湖北农业科学 2006,45 (4) 40-43
Position: Home > Articles > Changes of Thylakoid Membrane Characters in Wheat Flag Leaf under Light Stress Hubei Agricultural Sciences 2006,45 (4) 40-43

光逆境下小麦旗叶类囊体膜特性的变化

作  者：
孙磊;张成军;陈国祥;储慧君;王萍;王轶;姚金保
单  位：
南京师范大学生命科学学院;江苏省农业科学研究院粮食与作物研究所
关键词：
小麦;光抑制;光谱;类囊体膜;脂肪酸;电子传递活性
摘  要：
以宁麦8号和宁麦9号灌浆期旗叶类囊体膜为对象,研究光胁迫条件(2 500μmol.m-2.s-1)下旗叶类囊体膜特性的变化和品种间的差异。结果显示,随着强光处理时间延长,叶绿素含量呈明显下降趋势,同时类囊体膜的光能吸收能力和荧光发射强度减弱;类囊体膜脂不饱和脂肪酸含量降低,饱和脂肪酸含量增加,导致膜脂不饱和指数(IUFA)逐渐降低;IUFA和PSⅡ电子传递活性变化趋势一致,两者之间呈显著正相关。与宁麦8号相比,宁麦9号类囊体膜在光胁迫下的叶绿素含量和IUFA较高,PSⅡ放氧活性较强,显示宁麦9号对光胁迫有更高的抗性。
译  名：
Changes of Thylakoid Membrane Characters in Wheat Flag Leaf under Light Stress
作  者：
SUN Lei1,ZHANG Chen-jun1,CHEN Guo-xiang1,CHU Hui-jun1,Wang Ping1,WANG Yi1,YAO Jin-bao2(1.College of Life Sciences,Nanjing Normal University,Nanjing 210097,China; 2.Institute of Food Crops,Jiangsu Academy of Agricultural Science,Nanjing 210014,China)
关键词：
Triticum aesticum L.;photoinhibition;spectra;thylkakoid membrane;fatty acid;electron transport activities
摘  要：
Photosynthetic properties were investigated in isolated thylakoid membranes in flag leaves of two newly-developed wheat(Triticum aesticum L.)varieties,Ningmai 8(NM8)and Ningmai 9(NM9)during the grain-filling stage,in order to elucidate both changes of flag leaf thylakoid membrane and variety differences under light stress(2 500μmol·m-2·s-1).The results showed that the contents of chlorophyⅡ decreased with strong light-treated time delaying.Also,light absorbing and fluorescence emission intensities weakened.The contents of unsaturated fatty acids of thylakoid membrane lipids decreased and the saturated fatty acids increased with stressing time,resulting in a reduction in the index of unsaturation of fatty acid(IUFA).Correlation analysis showed that there were distinctly positive relationship between IUFA and the electron transport activities of PSⅡ.Higher IUFA and chlorophyⅡ contents and more O2-evolving activity were found in NM9 than those in NM 8 under light stress,and NM9 may have more resistance to photoinhibition of high light than NM8.

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