Position: Home > Articles > Effect of Atomic-layer Deposition of SiO_2 Process on Resistance Corrosion of Chemical Nickel-plate
Journal of Heilongjiang Bayi Agricultural University
2008,20
(2)
88-91
原子层沉积二氧化硅法对化学镀镍层耐蚀性的影响
作 者：
张吉军;孙武德;逢诗超;韩霞
单 位：
黑龙江八一农垦大学工程学院;黑龙江省林甸县巨浪牧场
关键词：
原子层沉积;化学镀镍;耐蚀性
摘 要：
在化学镀镍的基础上,采用原子层沉积二氧化硅法对镀镍层进行后处理,从而研究此种工艺方法对消除镀镍后产生的微孔,提高试样耐蚀性的效果。结果表明,在工艺参数选择的合适条件下,此工艺法可有效提高试样耐蚀性能。并利用光学显微观察、XRD分析等方法研究此工艺对镀层组织结构和耐蚀性影响。
译 名：
Effect of Atomic-layer Deposition of SiO_2 Process on Resistance Corrosion of Chemical Nickel-plate
作 者：
Zhang Jijun,Sun Wude,Feng Shichao,Han Xia(1.College of Engineering,Heilongjiang August First Land Reclamation University,Daqing 163319; 2.Heilongjiang Lin Dian County Ju Lang Stock Farm)
关键词：
Atomic-layer deposition;chemical nickel-plate;corrosion resistance
摘 要：
Basing on chemical nickel-plate,using Atomic-layer deposition of SiO2 process to deal with nickel-plate film,to study the effect of the process on canceling the tiny holes after chemical nickel-plate,to improve the corrosion resistance of the sample.The results showed that: on the condition of suitable craft parameter,the craft process could improve corrosion resistance of the samples effectively.The effect of the craft process on structure of chemical nickel-plate film and the corrosion resistance was analyzed by using optical microscope and XRD.
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